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pISSN : 1598-706X / eISSN : 2288-8381


(논문)연구논문

한국주조공학회지 (28권3호 24-128)

Characteristics of the Nitride Layers Formed on Ti and Ti-10wt.%Ta-10wt.%Nb Alloys by Plasma Nitriding

플라즈마 이온질화처리 된 Ti 및 Ti-10wt.%Ta-10wt.%Nb 합금의 표면에 형성된 질화층의 특성

Dong-Hun Kim, Doh-jae Lee, Kwang-Min Lee, Min-Ki Kim, Kyung-Ku Lee, *Bum-Su Park

Chonnam National University, *A. G. Optics Co.

Abstract

The nitride layer was formed on Ti and Ti-10 wt.%Ta-10 wt.%Nb alloy by a plasma nitriding method. Temperature was selected as the main experimental parameter for plasma nitriding. XRD, EDX, and hardness test were employed to analyze the evolution and material properties of the layer. The SEM observation of TiN nitride layer revealed that the thickness of nitride layer tended to increase with increasing temperature. δ-TiN, ε-Ti2N and α-Ti phases were detected by XRD analysis and the preferred orientation of TiN nitride layer was obviously observed at (220) plane with increasing temperature. From XRD analysis after step polishing the nitride specimens treated at 850oC, as polishing from the surface, TiN and Ti2N phases decreased gradually. After polishing the surface by 4 μm, a small amount of Ti2N and α-Ti phases were observed. The adhesive strength test result indicated that adhesive strength increased with increasing temperature.

Keywords

Ti alloy, Plasma nitriding, VAR