한국주조공학회

A vacuum casting was proposed as a new fabrication method of Si wafer for solar cell substrate. It was tried to fabricate a Si plate with good properties and to reduce the production cost by direct vacuum casting. By 5~10 cmHg of pressure difference Si plate with 50x46x1.5 mm³ was fabricated. For the preventing of the reaction between graphite mold and Si melt, BN powder coating or BN insert were used. The Si wafer was poly crystalline with 100 μm~1 mm order of grain size. And there were some twins and dislocations in the grains.